US Patent Issued to FEI on Sept. 29 for "Aberration correction systems and charged particle microscope systems including the same" (Dutch, American Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,644, issued on Sept. 29, was assigned to FEI Co. (Hillsboro, Ore.).

"Aberration correction systems and charged particle microscope systems including the same" was invented by Alexander Henstra (Utrecht, Netherlands), Galen Gledhill (Portland, Ore.) and Ali Gheidari (Best, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a charged particle source and an optical column. The optical column can include a multipole condenser with one or more condenser quadrupole-generating elements and/or a multipole objective with a plurality of ...