US Patent Issued to FEI on Oct. 27 for "Scanning patterns for scientific instruments" (Dutch Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,474, issued on Oct. 27, was assigned to FEI COMPANY (Hillsboro, Ore.).

"Scanning patterns for scientific instruments" was invented by Gert-Jan de Vos (Eindhoven, Netherlands), Joris Achten (Eindhoven, Netherlands), Addo Hammen (Eindhoven, Netherlands), Kees Kooijman (Eindhoven, Netherlands) and Sander Stoks (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for adjusting scanning patterns in scientific instruments based on electromagnetic interference. One example charged particle instrument includes a chamber supporting a sample, a column coupled to the chamber, a pump configured to establish a vacuum within ...