US Patent Issued to FEI on April 21 for "Charged particle microscope for examining a specimen, and method of determining an aberration of said charged particle microscope" (Czech Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,270, issued on April 21, was assigned to FEI Co. (Hillsboro, Ore.).

"Charged particle microscope for examining a specimen, and method of determining an aberration of said charged particle microscope" was invented by Lubomir Tuma (Brno, Czech Republic).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a method of determining an aberration of a charged particle microscope. The method comprises a step of providing a charged particle microscope that is at least partly operable by a user. Then, a set of image data is obtained with said charged particle microscope. The image data is processed to determine an aberration of said charge...