US Patent Issued to Evernorth Strategic Development on June 23 for "Systems and methods for automatically retraining machine learning models to remove systematic bias" (Illinois, New Jersey, Texas, Missouri Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,664,473, issued on June 23, was assigned to Evernorth Strategic Development Inc. (St. Louis).

"Systems and methods for automatically retraining machine learning models to remove systematic bias" was invented by Sandip Sonawane (Champaign, Ill.), Rahul Rajendran (Hackensack, N.J.), Vijay Sai Kondamadugu (Dallas) and Amit K. Bothra (Wildwood, Mo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A computer-implemented method includes generating a candidate machine learning model. The candidate machine learning model is configured to generate probability scores for members. The method includes training the candidate machine learning model using an initial dat...