ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,583, issued on June 23, was assigned to ETH ZURICH (Zurich).
"Plasmonic device enabling simplified fabrication" was invented by Andreas Christian Messner (Zurich, Switzerland), Joel Simon Winiger (Zurich, Switzerland), Ping Ma (Ruschlikon, Switzerland), Pascal Armin Jud (Dubendorf, Switzerland), Christian Haffner (Gaithersburg, Md.) and Juerg Leuthold (Neerach, Switzerland).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a plasmonic device (10), comprising: a substrate (11); and a dielectric layer (13) arranged between a base metal layer (12) and a structured metal layer (14) which form with respect to the substrate (11) a vertical stack ...