US Patent Issued to Entire Technology on May 26 for "Diffusion plate for use in backlight module with low optical path distance" (Taiwanese Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,638,718, issued on May 26, was assigned to Entire Technology Co. Ltd. (Taoyuan City, Taiwan).

"Diffusion plate for use in backlight module with low optical path distance" was invented by Chih Wen Yang (Taoyuan City, Taiwan) and Yu Wei Chang (Taoyaun City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention discloses a diffusion plate for use in a backlight module with a low optical path distance (OD), which can be assembled on a backlight module with a plurality of light-emitting diodes (LEDs) as the light source below. Different diffusion particle additives are added to the surface layers and the main layer of the diffusion plate, and th...