ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,427, issued on Sept. 8, was assigned to EGTM Co. LTD. (Suwon-si, South Korea).
"Method for forming region-selective thin film using selectivating agent" was invented by Jae Min Kim (Suwon-si, South Korea), Ha Na Kim (Suwon-si, South Korea) and Woong Jin Choi (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method of forming an area-selective thin film, the method comprising supplying the selectivity material to the inside of the chamber in which the substrate is placed, so that the selectivity material is adsorbed to a non-growth region of the substrate; purging the interior of the chamber; supplying a precursor t...