US Patent Issued to EBARA on March 24 for "Seal for chemical mechanical polishing device" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. D1,119,829, issued on March 24, was assigned to EBARA Corp. (Tokyo).

"Seal for chemical mechanical polishing device" was invented by Kazuhiro Tajima (Ota-ku, Japan), Makoto Kashiwagi (Ota-ku, Japan) and Manato Furusawa (Ota-ku, Japan).

The patent was filed on Sept. 26, 2023, under Application No. D/522,479.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1119829&OS=D1119829&RS=D1119829

Disclaimer: Curated by HT Syndication....