US Patent Issued to EBARA on Aug. 4 for "Retainer, top ring, and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,697,699, issued on Aug. 4, was assigned to EBARA Corp. (Tokyo).

"Retainer, top ring, and substrate processing apparatus" was invented by Yu Ishii (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A retainer is disposed around a holding region 39 of a polygonal substrate WF in a top ring for holding the polygonal substrate WF with a surface to be polished facing downward. The retainer 30 includes a plurality of retainer main bodies 3 disposed around the holding region 39 independently along respective sides of the polygonal substrate WF. At least one of the plurality of retainer main bodies 3 includes a first securing surface (first surface 3a), a fir...