US Patent Issued to EBARA on Aug. 18 for "Frame for chemical mechanical polishing device" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. D1,142,268, issued on Aug. 18, was assigned to EBARA Corp. (Tokyo).

"Frame for chemical mechanical polishing device" was invented by Kazuhiro Tajima (Tokyo), Makoto Kashiwagi (Tokyo) and Manato Furusawa (Tokyo).

The patent was filed on Sept. 26, 2023, under Application No. D/522,440.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1142268&OS=D1142268&RS=D1142268

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