US Patent Issued to EBARA on Aug. 11 for "Substrate conveyance method, substrate processing device, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,923, issued on Aug. 11, was assigned to EBARA Corp. (Tokyo).

"Substrate conveyance method, substrate processing device, and recording medium" was invented by Matsutaro Miyamoto (Tokyo), Ryuichi Kosuge (Tokyo) and Masumi Nishijima (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate conveyance method, a substrate processing device, and a recording medium are provided. The substrate conveyance method includes: conveying a substrate into a receiving unit and confirming that the substrate is present in the receiving unit by detecting that light irradiated from an optical sensor is blocked by the substrate conveyed to the receiving unit; and...