US Patent Issued to DUPONT ELECTRONICS on April 21 for "Polymer compositions having photoacid generators and photoresists" (Ohio, Texas Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,933, issued on April 21, was assigned to DUPONT ELECTRONICS INC. (Wilmington, Del.).

"Polymer compositions having photoacid generators and photoresists" was invented by Yongqiang Zhang (Dayton, Ohio), Qiu Dai (Centerville, Ohio), Michael Thomas Sheehan (Liberty Hill, Texas) and Murali Ganth Theivanayagam (Dayton, Ohio).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a first aspect, a polymer composition includes 0.5 to 99 mol % of a hydroxystyrene repeat unit, 0.5 to 99 mol % of a sulfonated photoacid generator repeat unit and 0.5 to 99 mol % of an acid labile repeat unit. In a second aspect, a photoresist composition includes the polymer composit...