US Patent Issued to DUK SAN NEOLUX on Oct. 6 for "Photosensitive composition for forming light blocking layer of organic light emitting device" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,477, issued on Oct. 6, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea).

"Photosensitive composition for forming light blocking layer of organic light emitting device" was invented by Changmin Lee (Cheonan-si, South Korea), Yun Jong Ko (Cheonan-si, South Korea), Hyunsang Cho (Cheonan-si, South Korea), Jaehyun Lim (Cheonan-si, South Korea), Hye Jung Choi (Cheonan-si, South Korea), Yeon Soo Lee (Cheonan-si, South Korea) and Nam Kyun Kim (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a photosensitive composition for forming a light shielding layer of an organic light emitting display device, which i...