US Patent Issued to DiaMonTech on Sept. 1 for "Apparatus and method for analyte measurement with improved detection of the deflection of a detection light beam" (German Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,721,550, issued on Sept. 1, was assigned to DiaMonTech AG (Berlin).

"Apparatus and method for analyte measurement with improved detection of the deflection of a detection light beam" was invented by Werner Mantele (Kiefersfelden-Muhlbach, Germany), Thorsten Lubinski (Berlin), Sergius Janik (Berlin) and Michael Kaluza (Berlin).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is an apparatus (10) for analyzing a material (12) comprising at least one analyte, said apparatus (10) comprising a measurement body (16) having a contact surface (14) suitable to be brought in thermal contact or pressure-transmitting contact with said material (12), a...