ALEXANDRIA, Va., March 31 -- United States Patent no. 12,589,415, issued on March 31, was assigned to DEVICE Co. LTD. (Chungcheongnam-do, South Korea).
"Substrate treatment apparatus" was invented by Taek Youb Lee (Cheonan, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a substrate treatment apparatus including: a substrate treatment apparatus including: a chuck base rotating together with a substrate in a state of supporting the substrate thereagainst; a fluid supply unit for supplying treatment liquid to the substrate; a bowl assembly having a plurality of bowls that overlap outward in a radial direction with respect to the center of the substrate in such a way...