US Patent Issued to DELTA ELECTRONICS on June 30 for "Vapor chamber with support structure" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,293, issued on June 30, was assigned to DELTA ELECTRONICS INC. (Taoyuan City, Taiwan).

"Vapor chamber with support structure" was invented by Shih-Lin Huang (Taoyuan City, Taiwan), Sien Wu (Taoyuan City, Taiwan), Baoxun He (Taoyuan City, Taiwan) and Ti-Jun Wang (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vapor chamber with a support structure is provided. The vapor chamber with the support structure includes a first plate, a second plate spaced apart from the first plate, and multiple support elements fixed between the first and second plates. On an outer surface of any of the first plate or the second plate, laser welding...