US Patent Issued to DELMIC IP on July 21 for "Method and apparatus for micromachining a sample using a focused ion beam" (Dutch Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,386, issued on July 21, was assigned to DELMIC IP B.V. (Delft, Netherlands).

"Method and apparatus for micromachining a sample using a focused ion beam" was invented by Daan Benjamin Boltje (Delft, Netherlands), Mart Guus Ferdinand Last (Delft, Netherlands), Marit Rosa Smeets (Delft, Netherlands), Caspar Theodorus Hugo Jonker (Delft, Netherlands) and Marcin Stefan Zielinski (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and an apparatus for micromachining samples are provided. The apparatus includes an integral combination of a sample holder, a focused ion beam (FIB) exposure system for projecting a FIB onto a sample, an...