US Patent Issued to Dai Nippon Printing on April 21 for "Deposition mask apparatus, method of manufacturing deposition mask apparatus and method of manufacturing organic device" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,606,899, issued on April 21, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo).

"Deposition mask apparatus, method of manufacturing deposition mask apparatus and method of manufacturing organic device" was invented by Hideyuki Okamoto (Tokyo) and Hiroshi Koi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A deposition mask apparatus includes a frame, a deposition mask, and an alignment mask. The alignment mask has two first alignment mask holes located at positions different from each other in the second direction and overlapping the frame. A first weld joining the frame with the alignment mask is located in an outer side of the alignment mask...