US Patent Issued to D2S on Oct. 6 for "Mask optimization preferentially accounting for overlap regions" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,473, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.).

"Mask optimization preferentially accounting for overlap regions" was invented by Donald Oriordan (Sunnyvale, Calif.) and Akira Fujimura (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments provide a method for optimizing a mask layout generated from a design layout of an IC. Based on an initial mask layout for a first layer, the method generates a simulated wafer image including shapes representing IC components of the layer, including a first component that has a relationship with a second component on a second layer of the design layout. The method ide...