US Patent Issued to D2S on Oct. 6 for "Mask optimization for layer based on comparison of components in layer to components in other layers" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,472, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.).

"Mask optimization for layer based on comparison of components in layer to components in other layers" was invented by Donald Oriordan (Sunnyvale, Calif.) and Akira Fujimura (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments provide a method for optimizing a mask layout for producing masks for manufacturing an integrated circuit (IC) by defining multiple layers of components on a substrate. The method generates, based on a first mask layout, a simulated wafer image including representations of IC components that are predicted to be manufactured for a fi...