US Patent Issued to D2S on Oct. 6 for "Concurrent mask optimization for multiple layers" (California Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,474, issued on Oct. 6, was assigned to D2S INC. (San Jose, Calif.).

"Concurrent mask optimization for multiple layers" was invented by Donald Oriordan (Sunnyvale, Calif.) and Akira Fujimura (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments provide a method for modifying a mask layout for producing masks used to manufacture an IC. The method identifies a first set of mask images corresponding to a first layer and a second set of mask images corresponding to a second layer. The method formulates a problem that expresses correlation between desired shapes of IC components and predicted as-manufactured shapes of the IC com...