US Patent Issued to Coventor on April 7 for "System and method for performing local CDU modeling and control in a virtual fabrication environment" (Chinese, Taiwanese, American Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,596,300, issued on April 7, was assigned to Coventor Inc. (Cary, N.C.).

"System and method for performing local CDU modeling and control in a virtual fabrication environment" was invented by Qing Peng Wang (Shanghai), Yu De Chen (Tainan City, Taiwan), Shi-hao Huang (Kaohsiung City, Taiwan), Rui Bao (Shanghai) and Joseph Ervin (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for performing local Critical Dimension Uniformity (CDU) modeling in a virtual fabrication environment are discussed. More particularly, local CD variance is replicated in the virtual fabrication environment in order to produce a CDU mask that can ...