US Patent Issued to Commissariat a l'Energie Atomique et aux Energies Alternatives on Nov. 3 for "Chemical vacuum deposition of a thin tungsten and/or molybdenum sulfide film method" (French Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,781,340, issued on Nov. 3, was assigned to Commissariat a l'Energie Atomique et aux Energies Alternatives (Paris).

"Chemical vacuum deposition of a thin tungsten and/or molybdenum sulfide film method" was invented by Remy Gassilloud (Grenoble Cedex, France) and Stephane Cadot (Grenoble Cedex, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is for depositing a thin tungsten and/or molybdenum sulfide film on a substrate chemically, under vacuum."

The patent was filed on Dec. 14, 2022, under Application No. 18/066,106.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect...