US Patent Issued to CNBM RESEARCH INSTITUTE FOR ADVANCED GLASS MATERIALS GROUP on Feb. 17 for "Method for post-treating an absorber layer" (German Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,425, issued on Feb. 17, was assigned to CNBM RESEARCH INSTITUTE FOR ADVANCED GLASS MATERIALS GROUP Co. LTD. (Bengbu, China).

"Method for post-treating an absorber layer" was invented by Michael Algasinger (Munich), Thomas Dalibor (Herrsching am Ammersee, Germany) and Joerg Palm (Munich).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for post-treating an absorber layer for photoelectric conversion of incident light into electric current. The method includes providing a chalcogen-containing absorber layer on a carrier, applying a post-treatment layer on a surface of the absorber layer, wherein the post-treatment material is not a buffer or com...