US Patent Issued to CMC Materials on Oct. 27 for "Positively charged abrasive with negatively charged ionic oxidizer for polishing application" (Japanese, American Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,400, issued on Oct. 27, was assigned to CMC Materials LLC (Aurora, Ill.).

"Positively charged abrasive with negatively charged ionic oxidizer for polishing application" was invented by Tsuyoshi Masuda (Tsu, Japan), Ryuta Kumashiro (Tsu, Japan), Hironao Fujii (Tsu, Japan), Takamasa Kanai (Tsu, Japan), Hiroshi Kitamura (Tsu, Japan), Helin Huang (Aurora, Ill.) and Yoshiyuki Matsumura (Kashihara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive particle; (b) an ionic oxidizer; and (c) water, wherein the chemical-mechanical polishing composition has a pH of...