ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,563,718, issued on Feb. 24, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei, China).
"Semiconductor structure and method for manufacturing same" was invented by Qinghua Han (Hefei, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor structure and a semiconductor structure are provided. The manufacturing method includes the following operations. A substrate is provided, and a first groove and a second groove are formed in the substrate, each of the first groove and the second groove having a depth in a first direction. The first groove includes multiple first sub-grooves arranged in the first direction...