US Patent Issued to CENTRAL GLASS on May 12 for "Method for removing molybdenum monofluoride to molybdenum pentafluoride and method for producing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,445, issued on May 12, was assigned to CENTRAL GLASS Co. LTD. (Ube, Japan).

"Method for removing molybdenum monofluoride to molybdenum pentafluoride and method for producing semiconductor device" was invented by Akiou Kikuchi (Yamaguchi, Japan) and Masato Shinagawa (Yamaguchi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method for removing MoFx or MoFx and MoOFx, including: bringing a halogen-containing gas into contact with a member having a deposit or a coating of MoFx or MoFx and MoOFx (where x represents a number greater than 0 and less than 6); and removing MoFx or MoFx and MoOFx from the member, a met...