US Patent Issued to CENTRAL GLASS on March 24 for "Surface treatment composition and method for producing wafer" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,446, issued on March 24, was assigned to CENTRAL GLASS COMPANY Ltd. (Ube, Japan).

"Surface treatment composition and method for producing wafer" was invented by Yoshiharu Terui (Tokyo), Yuzo Okumura (Tokyo) and Soichi Kumon (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A surface treatment composition of the present invention is a surface treatment composition that are supplied as a vapor to a surface of a wafer having an uneven pattern on the surface and used to form a water-repellent protective film on the surface, the surface treatment composition containing a silylating agent and a solvent, in which the silylating agent contains a trialk...