ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,060, issued on April 14, was assigned to CemeCon AG (Wurselen, Germany).
"Substrate receiving area for process chambers" was invented by Walter May (Aachen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a device for holding workpieces in a process chamber. The present disclosure additionally relates to a coating system and to a method for coating a workpiece. In order to allow for precise adjustment of the height of the position of workpieces while supporting same in a secure and stable manner, the holding device includes a platform for the workpieces, a height-adjustable first support element and a height...