ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,022, issued on Sept. 22, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Projection lens, projection exposure apparatus and projection exposure method" was invented by Alexander Epple (Aalen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "Dioptric projection lens for imaging a pattern in an object plane into an image plane via electromagnetic radiation at an operating wavelength in the ultraviolet range of longer than 280 nm comprises a multiplicity of lens elements between the object plane and the image plane along an optical axis configured so that a pattern in the object plane is able to be imaged into the image plane via the...