US Patent Issued to Carl Zeiss SMT on March 3 for "Method and apparatus for repairing a defect of a lithographic mask" (German Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,370, issued on March 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method and apparatus for repairing a defect of a lithographic mask" was invented by Markus Bauer (Schneckenlohe, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for repairing at least one defect of a lithographic mask comprises the step of: ascertaining parameters of at least one repair shape for the at least one defect, wherein ascertaining parameters comprises: allocating at least one numerical value to a parameter, wherein the numerical value deviates from the numerical value predefined by the at least one defect for said parameter."

The patent wa...