US Patent Issued to Carl Zeiss SMT on March 24 for "Optical system for a lithographic projection exposure apparatus" (German Inventor)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,193, issued on March 24, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Optical system for a lithographic projection exposure apparatus" was invented by Michael Patra (Oberkochen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An illumination optical unit serves for use in a lithographic projection exposure apparatus. The illumination optical unit serves to guide illumination light from a light source toward an object field. A structured object is arranged in the object field. The illumination optical unit is embodied such that the object field illuminated by the illumination optical unit has a field extent along a first field ...