ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,675, issued on June 30, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Method for producing a mirror of a lithography system" was invented by Christoph Zaczek (Heubach, Germany), Erik Loopstra (Huernheim, Germany) and Eric Eva (Aalen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a mirror of a lithography system includes providing first and second mirror parts. Cooling channels having elongate cooling channel openings in the region of a first connecting surface of the first mirror part are formed in the first mirror part, and/or cooling channels having elongate cooling channel openings in the region of a ...