ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,753, issued on June 30, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"EUV multi-mirror arrangement" was invented by Ralf Ameling (Aalen, Germany), Fabian Haacker (Aalen, Germany), Markus Holz (Aalen, Germany) and Johannes Eisenmenger (Ulm, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV multi-mirror arrangement comprises a multiplicity of mirror units arranged one next to the other in a grid arrangement on a carrier structure. Each mirror unit has a base element and, opposite the base element, an individually tiltable mirror element which has a mirror substrate that carries on a front face facing away from the base elemen...