US Patent Issued to Carl Zeiss SMT on June 16 for "Optical system, lithography apparatus and method" (German Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,693, issued on June 16, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Optical system, lithography apparatus and method" was invented by Stefan Krone (Ellwangen, Germany), Kai Kunze (Schwaebisch, Germany), Sven Urban (Neu-Ulm, Germany) and Philipp Torres Da Silva (Grossbottwar, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical system comprises: a plurality of optical components for guiding radiation in the optical system; a plurality of assemblies, each assembly comprising at least one actuator/sensor device assigned to one of the optical components; and a number of actuating units for actuating the plurality of assembli...