US Patent Issued to Carl Zeiss SMT on July 7 for "Method for particle beam-induced processing of a defect of a microlithographic photomask" (German Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,283, issued on July 7, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method for particle beam-induced processing of a defect of a microlithographic photomask" was invented by Thorsten Hofmann (Rodgau, Germany) and Michael Budach (Hanau, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for particle beam-induced processing of a defect of a microlithographic photomask, including the steps of: a1) providing an image of at least a portion of the photomask, b1) determining a geometric shape of a defect in the image as a repair shape, c1) subdividing the repair shape into a number of n pixels in accordance with a first rasteriza...