US Patent Issued to Carl Zeiss SMT on July 28 for "Method and apparatus for characterization of a microlithography mask" (German Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,594, issued on July 28, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method and apparatus for characterization of a microlithography mask" was invented by Ulrich Matejka (Jena, Germany), Sascha Perlitz (Jena, Germany) and Markus Deguenther (Florstadt, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a method and an apparatus for characterizing a microlithography mask. In one aspect, in a method according to the invention, the mask to be characterized is illuminated with light from a light source via an illumination optics unit, said light having a wavelength of less than 30 nm, wherein light that passes ...