ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,665, issued on July 21, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Method for producing a mirror of a microlithographic projection exposure apparatus" was invented by Christoph Zaczek (Heubach, Germany), Erik Loopstra (Huernheim, Germany) and Eric Eva (Aalen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a mirror of a microlithographic projection exposure apparatus comprises providing a first mirror part having a first connecting surface and a second mirror part having a second connecting surface is provided. Cooling channels and/or auxiliary channels are formed in the second mirror part. The method a...