US Patent Issued to Carl Zeiss SMT on July 14 for "Optical system, in particular for characterizing a microlithography mask" (German Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,320, issued on July 14, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Optical system, in particular for characterizing a microlithography mask" was invented by Ulrich Matejka (Jena, Germany), Sascha Perlitz (Jena, Germany) and Johannes Ruoff (Aalen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to an optical system and, in particular for characterizing a microlithography mask, comprising a light source for generating light of a wavelength of less than 30 nm, an illumination beam path leading from the light source to an object plane, an imaging beam path leading from the object plane to an image plane and ...