US Patent Issued to Carl Zeiss SMT on July 14 for "Method and apparatuses for disposing of excess material of a photolithographic mask" (German, French Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,382, issued on July 14, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method and apparatuses for disposing of excess material of a photolithographic mask" was invented by Michael Budach (Hanau, Germany), Christof Baur (Darmstadt, Germany), Klaus Edinger (Lorsch, Germany) and Tristan Bret (Rixheim, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at lea...