US Patent Issued to CARL ZEISS SMT, ASML NETHERLANDS on April 14 for "Method of setting up a projection exposure system, a projection exposure method and a projection exposure system for microlithography" (German, Dutch Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,978, issued on April 14, was assigned to CARL ZEISS SMT GMBH (Oberkochen, Germany) and ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method of setting up a projection exposure system, a projection exposure method and a projection exposure system for microlithography" was invented by Eva Schneider (Aalen, Germany), Toralf Gruner (Aalen, Germany) and Timur Tudorovskiy (Veldhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measuring system (MS) configured to measure a projection radiation property representing an aberration level at a plurality of spaced apart measuring points distributed in the image field; and an operating contr...