US Patent Issued to CANON on Sept. 1 for "Exposure apparatus and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,351, issued on Sept. 1, was assigned to CANON K.K. (Tokyo).

"Exposure apparatus and article manufacturing method" was invented by Shohei Iwata (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus for exposing a plurality of shot regions on a substrate includes a projection optical system, a drive mechanism configured to drive the substrate, a detector configured to detect a surface height of the substrate, and a controller configured to control the drive mechanism based on an output of the detector. The projection optical system is configured to project a pattern of an original to an exposure region in an image plane ...