US Patent Issued to CANON on Oct. 27 for "Substrate, analysis method, apparatus, and method of manufacturing substrate" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,961, issued on Oct. 27, was assigned to CANON K.K. (Tokyo).

"Substrate, analysis method, apparatus, and method of manufacturing substrate" was invented by Yoshinori Kotani (Kanagawa, Japan), Hiroshi Saito (Kanagawa, Japan) and Nobuki Yoshimatsu (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate includes projections containing metal. The projections include a first projection on which a first metal portion is formed, the first metal portion containing at least one of gold, silver, platinum, copper, and palladium. The projections include a second projection that is different from the first projection and on which a second meta...