ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,767, issued on Nov. 3, was assigned to CANON K.K. (Tokyo).
"Imprint apparatus, imprint method, and method of manufacturing article" was invented by Satoshi Iino (Saitama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An imprint apparatus that forms a pattern on a substrate using a mold and an imprint material comprises a plurality of measurement units configured to measure a misalignment amount between the mold and the substrate by detecting a plurality of internal measurement marks disposed on the mold and the substrate, an alignment unit configured to perform alignment of the mold and the substrate based on the misalignment amount measured b...