US Patent Issued to CANON on Aug. 25 for "Photocurable composition" (American, Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,715,942, issued on Aug. 25, was assigned to CANON K.K. (Tokyo).

"Photocurable composition" was invented by Fen Wan (Austin, Texas), Weijun Liu (Cedar Park, Texas) and Toshiki Ito (Kawasaki-city, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photocurable composition can comprise comprising a polymerizable material, a photoinitiator, and a photoacid generator, wherein the polymerizable material comprises at least one multi-functional vinylbenzene monomer in an amount of at least 10 wt % based on the total weight of the polymerizable material and the photoinitiator includes an oxime ester compound. The photocurable composition can be suitable for ...