US Patent Issued to CANON on Aug. 18 for "Substrate holding apparatus, substrate processing apparatus, separation method, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,710,700, issued on Aug. 18, was assigned to CANON K.K. (Tokyo).

"Substrate holding apparatus, substrate processing apparatus, separation method, and article manufacturing method" was invented by Yuichiro Morikuni (Tochigi, Japan), Shigeo Koya (Tochigi, Japan), Kazunori Nakajima (Tokyo), Hikari Watanabe (Tochigi, Japan) and Daisuke Ogawa (Saitama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate holding apparatus includes a holder configured to hold a substrate, and a gas supplier configured to supply a gas between the substrate and the holder, wherein when separating the substrate from the holder holding the substrate, the gas supplier s...