ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,637, issued on March 17, was assigned to Board of Regents, The University of Texas System (Austin, Texas).

"Roll-to-roll nanoimprint lithography tools and processes" was invented by Sidlgata V. Sreenivasan (Austin, Texas), Parth Pandya (Austin, Texas), Shrawan Singhal (Austin, Texas), Paras Ajay (Austin, Texas), Ziam Ghaznavi (Austin, Texas), Ovadia Abed (Austin, Texas) and Michael Watts (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for configuring ultraviolet (UV)-based nanoimprint lithography (NIL) for roll-to-roll (R2R) processing, which combines the benefits of inexpensive R2R processing with the precise nano...