ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,866, issued on Aug. 18, was assigned to Board of Regents, The University of Texas System (Austin, Texas).
"Equipment and process technologies for catalyst influenced chemical etching" was invented by Sidlgata V. Sreenivasan (Austin, Texas), Akhila Mallavarapu (Philadelphia) and Paras Ajay (Austin, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for etching a semiconductor substrate using catalyst influenced chemical etching. A group of independently controlled discrete actuators are configured to control a depth of an etch of a material on a substrate, where at least two of the group of independently controlled discrete actu...