ALEXANDRIA, Va., April 21 -- United States Patent no. D1,123,147, issued on April 21, was assigned to BMC (Tianjin) Medical Co. Ltd. (Tianjin, China).
"Frame for nasal mask" was invented by Yajie Wang (Tianjin, China), Mingzhao Zhou (Tianjin, China) and Zhi Zhuang (Tianjin, China).
The patent was filed on March 30, 2022, under Application No. D/832,768.
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