US Patent Issued to BENEQ on Sept. 29 for "Atomic layer deposition apparatus" (Finnish Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,499, issued on Sept. 29, was assigned to BENEQ OY (Espoo, Finland).

"Atomic layer deposition apparatus" was invented by Pekka Soininen (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "An atomic layer deposition layer apparatus including a substrate support having a support surface, a precursor supply head having an output face with at least one reaction zone via which precursors are supplied, and a rotating mechanism. The substrate support and the precursor supply head are arranged to be rotated relative to each other with the rotating mechanism. The at least one reaction zone includes a precursor supply zone open to the output face o...